LITHOGRAPHY

The NXQ200 UV-LED Flood Exposure System is designed to replace conventional Hg (Mercury) light sources operating either in broadband or at i-line (365nm).

The UV intensity is fully adjustable through software control.  UV intensities, as measured on the exposure plane are:

• Up to 31mW/cm² @ 365nm

• Up to 75mW/cm² @ 405nm

The NXQ200 intensities equate to Hg light sources operating at 1,000W

Accommodates up to 200mm wafer size

Software control of exposure wavelength(s) and intensity

Long-lasting with no routine maintenance requirement due to UV-LED light source

Constant intensity, monitored and controlled by on-board metrology

Instant ON, with no light source warm-up

Low power consumption

Closed-loop, liquid-cooled system

USB remote interface

Non-uniformity <3%

19” 4U rack-mounted controller

Standard light source size is 10”x10”x36”, with custom designs available

Configurations available for:

• UV Curing 

• Shadow Mask/Edge Bead 

• 1^st Mask 

• Replacement for track-based Hg Flood Expose units