LITHOGRAPHY
NXQ200 UV-LED Flood Exposure System

The NXQ200 UV-LED Flood Exposure System is designed to replace conventional Hg (Mercury) light sources operating either in broadband or at i-line (365nm).
The UV intensity is fully adjustable through software control. UV intensities, as measured on the exposure plane are:
Up to 31mW/cm2 @ 365nm
Up to 75mW/cm2 @ 405nm
The NXQ200 intensities equate to Hg light sources operating at 1,000W
Accommodates up to 200mm wafer size
Software control of exposure wavelength(s) and intensity
Long-lasting with no routine maintenance requirement due to UV-LED light source
Constant intensity, monitored and controlled by on-board metrology
Instant ON, with no light source warm-up
Low power consumption
Closed-loop, liquid-cooled system
USB remote interface
Non-uniformity <3%
19” 4U rack-mounted controller
Standard light source size is 10”x10”x36”, with custom designs available
Configurations available for:
UV Curing
Shadow Mask/Edge Bead
1st Mask
Replacement for track-based Hg Flood Expose units
- Biotechnology, Microfluidics, Microelectronics, LED, MEMS, Compound Semiconductor, Solar, Optoelectronics
- Advanced Packaging:
- 3DIC
- SIP
- WLP
- 2.5D Interposer
Product Literature
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