LITHOGRAPHY

Morgan Hill, Calif. (August 19, 2025) — Neutronix-Quintel, Inc. (NXQ), a leading provider of production photolithography equipment, is proud to introduce the LumeX Flood Exposure System — our latest advancement in precision photolithography. Engineered to replace conventional mercury light sources, operating in broadband or i-line, LumeX uses next-generation UV-LED technology to deliver consistent, controlled exposure. Intensity is monitored and adjusted in real time by on-board metrology. No warm-up. No drift. No downtime. With software control of wavelength and intensity, LumeX offers unmatched flexibility, including a polychromatic light source for a wide range of processes. Its long-lasting UV-LED design means no routine maintenance, dramatically reducing operating costs. Instant ON capability boosts efficiency, while low power consumption minimizes environmental impact. The compact and modular bench-top design supports wafer sizes up to 200mm with a full 200mm uniform light beam. With wireless connectivity, you can run the system from a tablet — giving you freedom and convenience like never before. Even the illuminated LumeX LED logo can be turned on or off with a single tap, adding a visual touch of modern design to your workspace.

According to Brett Arnold, President of NXQ, “Based upon customer requirements, NXQ designed and delivered its next generation flood exposure system, the LumeX Flood Exposure System. The LumeX Flood Exposure System uses the same UV-LED light source as we have designed for our advanced mask aligners.  All work has been completed to offer this product as a standalone system or integrated with our advanced lithographic products.  The LumeX Flood Exposure System has numerous applications within the fab including UV Curing, Shadow Mask/Edge Bead, 1st Mask, or as a replacement for track-based Hg flood expose units.”

The LumeX Flood Exposure System is designed to replace conventional broadband or i-line flood exposure tools.  The UV-LED light source replaces traditional Hg light sources that operate between 250W to 1,000W, has selectable spectral output, and is fully adjustable through software providing wafer-level intensities up to 75 mW/cm2 at 405nm wavelength, or up to 31 mW/cm2 at 365nm.  The LumeX Flood Exposure System accommodates wafers up to 200mm, with non-uniformity better than 3%, and no need for routine adjustment due to onboard self-monitoring and precision dose control.