The announcement highlights the NXQ8006M lithography tools for the production of energy storage devices.
Morgan Hill, Calif. (November 8, 2023) — Neutronix-Quintel, Inc. (NXQ), a leading provider of production photolithography equipment, today announced the introduction of the NxQ 8000 CT mask aligner to be used for advanced applications. According to Brett Arnold, President of NXQ, “NXQ continues to push-the-envelope in terms of designing and manufacturing state-of-the-art mask aligners capable of handling all types and sizes of substrates used in R&D, pilot production, and high-volume manufacturing environments, that push imaging capability down to 0.5 µm and overlay to below 0.25 µm (3. The NxQ 8000 CT embodies everything an advanced mask aligner should be by combining advanced imaging and overlay capability combined with a small footprint and the ability to handle different substrate types, form factors, and sizes.
The NxQ 8000 CT Production Mask Aligner integrates a state-of-the-art stage and alignment system to achieve alignment precision of 0.1 µm and topside alignment accuracy of 0.25 µm (3). The NxQ 8000 CT Production Mask Aligner also provides backside alignment accuracy of 0.35 µm (3) and through-substrate infrared alignment accuracy of 0.50 µm (3). The NxQ 8000 CT is equipped with a high-performance UV-LED exposure source lasting 7-10 years in an HVM environment and can be configured with automatic mask loading and full hardware and software readiness to be mated with coaters, developers, or any other process tools.
NXQ manufactures photolithography and metrology equipment for customers who develop and manufacture a wide range of semiconductor products including MEMS, Wafer Level Packaging (WLP), 3DIC, System in Package (SIP), Compound Semiconductor (CS), Microfluidics, Optoelectronics and Bio Science technologies. NXQ was founded by industry veterans and has been designing and manufacturing mask aligners for over 35 years.