Announcement highlights the of a NXQ8006M lithography tools for production of energy storage devices
Morgan Hill, Calif. (June 8, 2021) — Neutronix-Quintel, Inc. (NXQ), a leading provider of production photolithography equipment, today announced the sale of a NXQ8006M mask aligner to be used in the production of energy storage devices.
According to Brett Arnold, President of NXQ, “NXQ continues to push-the-envelope in terms of designing and manufacturing state-of-the-art mask aligners capable of handling all types and sizes of substrates used in R&D, pilot production, and high-volume manufacturing environments, that push imaging capability down to 1.0 micron. The NXQ8006M is a workhorse that offers a small footprint combined with a UV-LED exposure source producing polychromatic or monochromatic outputs, and best-in-class overlay performance.”
The NXQ8006M Production Mask Aligner integrates state-of-the-art alignment stage design. Equipped with the revolutionary UV-LED exposure source, the printing performance is superior to that of mercury lamp sources and will last 7-10 years in an HVM environment before any major service is required. The NXQ8006M alignment stage utilizes the latest in linear motion technology so the vision system is not limited by the hardware, allowing for alignment accuracies of less than 0.5um 3 sigma. This accuracy is achieved using our Quadcam Microscope with 5x objectives, delivering an ideal combination of magnification, field-of-view, and depth-of-focus.
NXQ manufactures photolithography and metrology equipment for customers who develop and manufacture a wide range of semiconductor products including MEMS, Wafer Level Packaging (WLP), 3DIC, System in Package (SIP), Compound Semiconductor (CS), Microfluidics, Optoelectronics and Bio Science technologies. NXQ was founded by industry veterans and has been designing and manufacturing mask aligners for over 35 years.